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Product information
Eulitha AG's PHABLE technology is a unique lithography technique for producing nanocycle patterns with high efficiency. The technique uses a non-contact proximity UV or DUV exposure scheme to achieve nanoresolution patterns over large areas. It is especially suitable for industrial production in optoelectronic related fields, with high precision and good stability.
Eulitha offers a unique optical exposure solution for producing high-resolution periodic patterns at low cost:
PhableR manual lithography machine for research and production for low volume requirements.
PhableX automatic lithography machine for industrial grade production.
PhableS stepper lithography machine for industrial production with larger area requirements.
Application field:
Lighting, lasers, optical communication, high-end display, solar energy, sensors, bionics, etc.
Features and advantages:
Stable nanoscale resolution;
Large area full exposure without splicing;
Unlimited DOF, thick glue, surface warping has no effect;
Dual working mode:
Holographic lithography mode: periodic nanostructure;
Mask alignment lithography mode: any micron structure.
The simplified exposure process enables one-click exposure
Flexible customized solutions
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