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RHEED graphic analysis system
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Price:
price negotiable
Brand Name:
k-SpaceCountry Region:
U.S.AModel No:
kSA 400
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k-Space 
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Country: U.S.A
Main Products: Thin film performance testing equipment
View more
Price:
price negotiable
Brand Name:
k-SpaceCountry Region:
U.S.AModel No:
kSA 400
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k-Space 
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U.S.A
Main Products:
Thin film performance testing equipment

Product information
kSA 400 RHEED图形分析系统,适合各种薄膜沉积系统(如:脉冲激光沉积设备PLD,溅射系统Sputtering,分子束外延MBE, 金属有机化学气相沉积MOCVD等)上的RHEED系统。目前第四代系统结合优质的硬件和软件,为客户提供丰富的RHEED分析信息。
原理
软件分析RHEED反射式高能电子衍射,对来自样品薄膜的衍射图像进行采集,并通过系统自动计算测量晶格间距、共振长度和振动强度,同时通过衍射条纹的强度震荡曲线检测薄膜沉积速率。
分析功能
同时测量晶格间距、相干长度和晶体表面结构演化;薄膜沉积速率和沉积厚度分析;三维衍射图像分析等。
基本配置
• CCD系统:标准型,高分辨型
• 光学系统:RHEED定量分析及成像分析
• 标准接口法兰(可定制)
主要特点和功能
• 衍射图像采集采用先进的CCD和光学系统
• 实时的薄膜生长速率测量
• 实时晶格间距和表面均匀性分析
• 专业的技术支持
• 多个品牌的电子枪全面控制功能可供选择
• 适用于多种薄膜沉积系统:MBE、 PLD、溅射和电子束蒸发等
• 持续不断的软件系统更新
可选功能
• 包含锁相外延生长(PLE)
• 低能电子衍射(LEED)
• 俄歇电子能谱(Auger)
• 光电子能谱(XPS)等
实际应用
主要用于安装在真空薄膜沉积设备上,在薄膜生长过程中,对该薄膜材料的多项物理特性进行实时原位的分析,进而进一步指导和优化薄膜的生长工艺。
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