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Product information
桌面型原子层沉积系统由哈佛大学纳米科学中心薄膜沉积工艺研究科学家Dr. Philippe de Rouffignac设计,基于多年纳米薄膜制备的丰富经验以及对科研工作者切实研究需要的了解,推出了此桌面型、高性能的原子层沉积系统。具有人性化的设计且操作便捷。
主要特点:
• 腔室专为R&D设计和优化,样品尺寸达直径4’’,可升级至6'';
• 反应腔温度可控范围:RT-350℃;
• 前驱体源温度可控范围:RT-150℃;
• 腔室处理压力可控范围:0.1-1.5 torr;
• 源扩展多达5个;
• 快速循环处理功能;
• 气路优化设计、腔体小型化设计;
• 一分钟多达6-10;
• 成熟的薄膜Recipes内置程序;
• 触屏PLC控制;
• 可配套手套箱使用;
• 可配备臭氧发生器;
可处理材料
MATERIAL CLASS | STANDARD RECIPES | RECIPES IN DEVELOPMENT | SYSTEM CAPABLE MATERIALS |
Oxides (AxOy) | Al, Si, Ti, Zn, Zr, Hf | V, Y, Ru, In, Sn, Pt | Li, Be, Mg, Ca, Sc, Mn, Fe, Co, Ni, Cu, Ga, Sr Nb, Rh, Pd, Sn, Ba, La, Pr, Nd, Sm, Eu, Gd |
Elementals (A) | Ru, Pd, Pt, Ni, Co | Rh, Os, Ir | Fe, Cu, Mo |
Nitrides (AxNy) | Zr, Hf, W | Ti, Ta | Cu, Ga, Nb, Mo, In |
Sulfides (AxSy) | Ca, Ti, Mn, Cu, Zn, Sr, y, Cd, In, Sn, Sb, Ba, La, W | ||
Other Compounds | AZO (AL:ZnO), AxSiyOz ()A=Al, Zr, Hf | YSZ (yttria stabilized sirconia) ITO | Many others |
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