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Equipment Name: Silicon Carbide epitaxy furnace equipment model: YS-E06S01 equipment functions: silicon carbide substrate grown by CVD method size: 4-inch compatible 6-inch, 6-inch compatible 8-inch in-chip thickness heterogeneity: < 2% in-chip doping concentration heterogeneity: < 5% morphology defect density: < 1/CM2 equipment features: 1, with N, P-type and high-rate epitaxy growth capacity; 2、 high uniformity and low defect SIC Epitaxy Quality 3、 RUN TO RUN excellent performance 4、 Integrated Liquid Supply System.

Guangzhou Yuesheng Semiconductor Equipment Co. , Ltd. is a professional r & D and production of semiconductor equipment companies, was established in the 2021. The company focuses on silicon carbide epitaxy equipment, silicon carbide crystal growth equipment r & D and production, to help customers produce high-quality silicon carbide epitaxy wafers and wafers. The company has a first-class technical team and advanced production equipment, to provide customers with high-end, efficient and highly reliable solutions. The company is committed to become the world's first-class silicon carbide equipment suppliers, through the provision of high-quality products and services to promote the development of silicon carbide industry, to create a better life.

Company Profile

Guangzhou YS Semiconductor Equipment Co., Ltd. is a company specializing in R&D and production of semiconductor equipment, established in 2021. The company focuses on the R&D and production of silicon carbide epitaxial equipment and silicon carbide crystal growth equipment, helping customers produce high-quality silicon carbide Epi-wafers and wafers. The company has a first-class technical team and advanced production equipment to provide customers with high-end, efficient and high-reliability solutions. The company is committed to becoming a world-class supplier of silicon carbide equipment, promoting the development of silicon carbide industry and creating a better life by providing high-quality products and services.