








Product information
The manual magnetron sputtering system is suitable for undergraduate teaching, graduate research training, and can also be applied to scientific research work. This device is suitable for magnetron sputtering and can also be equipped with electron beam evaporation, thermal evaporation sources, etc. Users can choose to equip it according to their needs.
Technical parameters:
1. Background vacuum: 10-7 Torr;
2. Single substrate design, customizable size;
3. The substrate can rotate and be heated: 300 ℃/500 ℃/800 ℃;
4. Sputtering: 1-3 magnetron sputtering target guns, capable of co sputtering;
5. Electron beam evaporation: 4-6 crucibles;
6. Thermal evaporation: up to 6 evaporation sources, including organic evaporation sources;
7. Can be connected to a glove box.

















