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Product information
The multi station magnetron sputtering coating machine can simultaneously place multiple substrates, suitable for small batch production on research and development lines or pilot lines. The rotatable substrate stage provided by Siqi facilitates customers to flexibly adjust each substrate to correspond to different target positions. Pre installed with the industrial grade fully automatic control system independently developed by Siqi, the equipment can automatically produce according to the preset process flow. The process repeatability is better than ± 3%, effectively ensuring production stability.
Technical parameters:
1. Background vacuum of 10-7 Torr;
2. Multi substrate design, quantity and size can be customized;
3. The substrate stage can revolve, rotate, and heat up: 300 ℃/500 ℃/800 ℃;
4. Can expand up to 6 magnetron sputtering target guns and 6 workstations;
5. The sputtering distance of the target gun can be adjusted, and the strong magnetic target can be upgraded;
6. Design of cross contamination shielding board;
7. Can be equipped with sample pre cleaning function;
8. Can be equipped with a rapid injection chamber;
9. Can be equipped with an automatic pressure control system;
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