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Product information
The Siqi ultra-high vacuum magnetron sputtering coating machine adopts world-class UHV accessories and metal seals, and the background vacuum can reach the level of 10-9~10-10 Torr. Thin film materials prepared in ultra-high vacuum environments have lower oxygen content and more pronounced grain size, making them widely applicable for research and development in superconducting junctions, quantum devices, and spintronics.
Technical parameters:
1. The background vacuum can reach 10-9~10-10 Torr;
2. Single substrate design, customizable size;
3. The substrate can rotate and be heated: 300 ℃/500 ℃/800 ℃;
4. Up to 8 magnetron sputtering target guns can be expanded for co sputtering;
5. The target gun angle can be adjusted, the sputtering distance can be adjusted, and the strong magnetic target can be upgraded;
6. Design of anti cross contamination partitions;
7. Can be equipped with ion beam assisted deposition;
8. Can be equipped with sample pre cleaning function;
9. Can be equipped with a rapid injection chamber;
10. Can be equipped with an automatic pressure control system;
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