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Product information
Vertical linear continuous magnetron sputtering is suitable for the research and production of large-sized substrate products. The equipment consists of a sample chamber, a sputtering chamber, a sample chamber, and a substrate transfer mechanism, which can achieve continuous coating. It is widely used in the development and production of display devices and photovoltaic thin films. Silicon based has rich experience in the production of industrial grade large-sized equipment, and currently has sales performance of linear continuous magnetron sputtering equipment in Guangdong and Beijing regions.
Technical parameters:
1. Background vacuum of 10-7 Torr;
2. Substrate size: 490x390 mm (glass substrate);
3. The substrate is transported vertically with adjustable transport speed;
4. The substrate can be heated to 400 ℃;
5. The number of sputtering chambers can be freely expanded;
6. The uniformity of coating on a 20 inch substrate is better than ± 3%;
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