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+86 25-84532303
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sunyuchen@sumec.com.cn
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Mass production atomic layer deposition
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SYSKEY
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Taiwan, China
Main Products:
Sputter, E-Beam, Thermal Evaporator, ALD, PEALD, RIE, PECVD, and LPCVD
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Product information

Special cavity design and process design can enable ALD technology to be applied in industrial mass production and maximize coating efficiency. Xiqi can customize equipment according to user needs.
Technical parameters:
1. Stainless steel chamber with double-layer heating design;
2. The plasma enhancement module is integrated into the upper cover of the cavity;
3. Imported high-speed ALD diaphragm valve;
4. The substrate size can be customized;
5. The substrate can be heated up to 400 ℃;
6. Up to 6 precursor and 6 process gases can be provided;
7. The gas path is fully sealed with metal and can be heated to 120 ℃;
8. Can provide heating or cooling for precursor steel cylinders;
9. The process can be fully controlled automatically, and manual operation is also possible.
10. Mass production design that can be fully automated

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