Sumec menuSumec menu

SUMEC TOUCH WORLD

Global Trading Service Platform for Machinery

search Search
Image
中文
Image
+86 25-84532303
Image
sunyuchen@sumec.com.cn
1 / 1
Low Pressure Chemical Vapor Deposition, LPVD
iconicon
Post RequirementsPost Requirements
SYSKEY
SYSKEY icon
View more
Post RequirementsPost Requirements
SYSKEY
SYSKEY icon
Taiwan, China
Main Products:
Sputter, E-Beam, Thermal Evaporator, ALD, PEALD, RIE, PECVD, and LPCVD
icon

Product information

Low Pressure Chemical Vapor Deposition (LPVD) refers to the deposition of thin films in a low-pressure environment, which can be used for large-area and small batch sample deposition.
Technical parameters:
1. The substrate size can be customized, up to a maximum of 10 inches;
The maximum heating temperature is 1700 ℃, with options for single or multiple temperature zones;
3 can be configured with up to 6 process gases;
4. Equipped with oil pump or dry pump, optional molecular pump;
5 sample horizontal and vertical configuration modes;
6 can be mass-produced in small quantities;
Application areas:
LPCVD
annealing
spread
oxidation

All products in the store
Magnetron sputtering (co sputtering)All products in the store
Mini Line Micro Device PlatformAll products in the store
Lift off electron beam evaporation coating machineAll products in the store
Manual coating systemAll products in the store
Thermal evaporation coating machineAll products in the store
CIGS solar cell coatingAll products in the store