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Low Pressure Chemical Vapor Deposition, LPVD


Price:
price negotiable
Brand Name:
SYSKEYCountry Region:
Taiwan, China

SYSKEY 

Country: Taiwan, China
Main Products: Sputter, E-Beam, Thermal Evaporator, ALD, PEALD, RIE, PECVD, and LPCVD
View more
Price:
price negotiable
Brand Name:
SYSKEYCountry Region:
Taiwan, China

SYSKEY 

Taiwan, China
Main Products:
Sputter, E-Beam, Thermal Evaporator, ALD, PEALD, RIE, PECVD, and LPCVD

Product information
Low Pressure Chemical Vapor Deposition (LPVD) refers to the deposition of thin films in a low-pressure environment, which can be used for large-area and small batch sample deposition.
Technical parameters:
1. The substrate size can be customized, up to a maximum of 10 inches;
The maximum heating temperature is 1700 ℃, with options for single or multiple temperature zones;
3 can be configured with up to 6 process gases;
4. Equipped with oil pump or dry pump, optional molecular pump;
5 sample horizontal and vertical configuration modes;
6 can be mass-produced in small quantities;
Application areas:
LPCVD
annealing
spread
oxidation
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