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sunyuchen@sumec.com.cn
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PECVD and RIE combined system
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SYSKEY
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Post RequirementsPost Requirements
SYSKEY
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Taiwan, China
Main Products:
Sputter, E-Beam, Thermal Evaporator, ALD, PEALD, RIE, PECVD, and LPCVD
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Product information

SYSKEY has also customized a cost-effective PECVD and RIE combined system for customers, which adopts a unified vacuum gas path and electronic control system, effectively saving costs while achieving multifunctionality.
 

Technical parameters:
1. The substrate size can be customized;
2. Silicon oxide, silicon nitride, and polycrystalline silicon coatings;
3. Etching of metals, electrolytes, and III-V materials;
4. The uniformity of coating and etching is better than ± 5%;

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