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Hot Wire Assisted Chemical Vapor Deposition, HWCVD
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Taiwan, China
Main Products:
Sputter, E-Beam, Thermal Evaporator, ALD, PEALD, RIE, PECVD, and LPCVD
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Product information

Hot Wire Assisted Chemical Vapor Deposition (HWCVD) refers to the chemical vapor deposition of thin films under the condition of heating wire assistance, suitable for high-temperature crystalline materials. In addition to heating wire assistance, plasma enhanced coils can also be used to further assist, thereby improving the crystal orientation of the prepared thin films.
Technical parameters:
1. The substrate size can be customized;
2. The maximum heating temperature is 2000 ℃;
3. Heating temperature of the sample stage 

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