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Molecular beam ‍ epitaxial system MBE
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China
Main Products:
Molecular beam epitaxy system (MBE), pulsed laser deposition system (PLD), reflective high energy electron diffractometer (RHEED), evaporation source, electron gun, ion gun, etc
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Product information

 

Standard MBE System - OCTOPLUS 800

Chamber size: 800 mm ID, liquid nitrogen cooling screen
Background vacuum:<5 × 10-11 mbar
Vacuum system: cold pump+ion pump+titanium sublimation pump
Sample size: 8 '', 6 '', 4 '', 3x3 '', 7x2 ''
Heater: optional Ta/PG/W material, temperature can reach 800 ℃, 1000 ℃ or 1400 ℃
Source furnace flange: 12 x DN 100 CF
Application areas: SiGe, III-V, II-VI, etc-Pilot system

-Applicable to Si/Ge, III-V, II-VI

-Applicable substrate sizes: 8 '', 6 '', 4 '', 3 x 3 '', 7 x 2 ''

-Fully automatic sample transmission and process flow

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