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Molecular beam epitaxy system accessories sample holder SH
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China
Main Products:
Molecular beam epitaxy system (MBE), pulsed laser deposition system (PLD), reflective high energy electron diffractometer (RHEED), evaporation source, electron gun, ion gun, etc
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Product information

The sample holder can be used for III/V MBE systems, GaN MBE systems, SiC and SiGe MBE systems, etc. The tungsten heated sample holder is suitable for most high-temperature material applications. Tantalum wire heaters are commonly used in III/V group material growth MBE systems, while pyrolytic graphite heaters are recommended for SiGe MBE systems. If the sample stage needs to be used in an oxygen environment, consideration should be given to the anti oxygen pressure sample stage SH-O.


-Applicable sample size: 2 '' -6 ‘’

-Heating temperature: 800-1200 ℃ (depending on the heater material)

-Speed 0-30 rpm, continuously adjustable

-Heater material: Ta, W, PG, SiC, etc. available for selection

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