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Product information
Atomic hydrogen source HABS: Low temperature cleaning of III-V substrate surface
Atomic Oxygen Source OBS: Growth and Surface Cleaning of Oxide Thin Films
Microwave plasma source
-Power: 5-20 W/2.5 GHz
-Gas flow rate: 1-10 sccm
-Applicable gases: N2, H2, O2
-Application: Surface cleaning, preparation of oxide and nitride materials
Oxygen atom source - OBS is a thermal mode gas splitting source that can generate an ionized H atom beam, effectively avoiding the impact of ion bombardment on the substrate.
characteristic:
The efficiency of oxygen atom splitting can reach 80%
Atomic hydrogen density up to 10 ^ 15/s * cm2
There are no high-energy particles or ions present
low power consumption
Integrated water cooling
The hydrogen atom source HABS is a thermal mode gas splitting source that can generate an ionized H atom beam, effectively avoiding the impact of ion bombardment on the substrate.
Product features:
The efficiency of hydrogen atom cracking can reach 80%~98%
Atomic hydrogen density up to 10 ^ 16/s * cm2
There are no high-energy particles or ions present
Low power consumption:<200 W
Integrated water cooling
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Direct to specific products: Molecular Beam Epitaxy (MBE), Pulsed Laser Deposition (PLD), Reflective High Energy Electron Diffraction (RHEED), Evaporation Source, Ion Source, Electron Gun
If you have any equipment requirements or technical inquiries, please feel free to contact us at any time.
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