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Pulsed laser deposition/laser molecular beam epitaxy system
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Main Products:
Molecular beam epitaxy system (MBE), pulsed laser deposition system (PLD), reflective high energy electron diffractometer (RHEED), evaporation source, electron gun, ion gun, etc
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Product information

Pulse laser deposition system (PLD)

Twente Solid State Technology BV (TSST) in the Netherlands focuses on providing customized pulsed laser deposition systems (PLDs) and related thin film preparation solutions for users. The company has over 20 years of experience in researching and producing pulsed laser deposition systems.

TSST maintains close cooperation with MESA+Institute at Twente University in the Netherlands, one of the world's largest research centers for nano and microsystem technology, to develop core technologies required for various pulsed laser deposition techniques.

Principle of pulsed laser deposition: In a vacuum environment, pulsed laser is used to bombard the surface of the target material, and the local heat generated by the laser is used to bombard the target material, which is then deposited on different substrates to form a thin film.

 

PLD working principle diagram


Laser molecular beam epitaxy system (LMBE) is an epitaxial thin film growth technology developed on the basis of PLD.

Realizing in-situ monitoring of RHEED under high oxygen pressure environment was once an important challenge in RHEED analysis. TSST was the first to propose differential pumping method to achieve in-situ monitoring of RHEED under high pressure environment - TorrRHEED. TSST is the inventor of TorrRHEED and has rich experience in system manufacturing, RHEED use, and result analysis.

Standard Laser Molecular Beam Epitaxy System (LMBE)

Pulse laser deposition technology is suitable for producing various types of thin films, including multi-element oxide, nitride, sulfide thin films, metal thin films, magnetic materials, etc.

 

Application areas:

Single crystal thin film epitaxy (SrTiO3, LaAlO3)

Piezoelectric thin film (PZT, AlN,BiFeO3,BaTiO3)

Ferroelectric thin film (BaTiO3, KH2PO4)

Thermoelectric thin film (SrTiO3)

 

Metal and compound thin film electrodes (Ti, Ag,Au,Pt,Ni,Co,SrRuO3,LaNiO3,YZrO2,GdCeO2,LaSrCoFeO3)

Semiconductor thin films (Zn (Mg) O, AlN, SrTiO3)

High K dielectric thin films (HfO2, CeO2,Al2O3,BaTiO3,SrTiO3,PbZrTiO3,LaAlO3,Ta2O5)

Superconducting thin films (YBa2CuO7-x, BiSrCaCuO)

Optical waveguide, optical thin film (PZT, AlN,BaTiO3,Al2O3,ZrO2,TiO2)

Superhydrophobic film (PTFE)

Infrared detection thin film (V2O5, PZT)

 

Epitaxial thin film display

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Direct to specific products: Molecular Beam Epitaxy (MBE), Pulsed Laser Deposition (PLD), Reflective High Energy Electron Diffraction (RHEED), Evaporation Source, Ion Source, Electron Gun

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