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可原位更换坩埚电子束蒸发
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China
Main Products:
Molecular beam epitaxy system (MBE), pulsed laser deposition system (PLD), reflective high energy electron diffractometer (RHEED), evaporation source, electron gun, ion gun, etc
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Product information

可以应用于多种材料蒸发,如Ag,Au,Al,Ni,Co,Fe等,以及有机材料蒸发。蒸发材料放在W坩埚内,将坩埚装载于旗形样品托上,蒸发源上端可以允许摆动夹钳机械手或者操控器拉出旗形样品托,进行快速的原位更换坩埚。

坩埚的填料容积是0.5cc,冷却循环水确保薄膜在低于10-9mbar气压下生长。蒸发源配备了手动挡板,以及C型热偶。

特点:

法兰尺寸:CF40;

真空腔体内长度:185 mm;

部件:旗形样品托及W坩埚,磁耦合挡板旋转;

水冷接头:G1/8转6 mm卡套接头;

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