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Product information
The Molecular Beam Epitaxy System (MBE) OCTOPLUS 300 is a versatile and fully functional compact MBE system that is ideal for growing thin film materials for small size samples. Although the design is compact, it can be assembled with a number of different types of source furnaces to achieve the epitaxial film growth of various materials.
Chamber size: 350 mm ID, liquid nitrogen cold screen
Background vacuum: < 8 × 10-11 mbar
Sample size: up to 2 inches, downward compatible with small size samples
Heater: SiC, W and other types of optional, the highest temperature up to 1500 ℃
Source furnace flange: 8× DN63CF
Applications: Topological insulators, metals, 2D materials (metal sulfides/selenides), etc
Product features:
● Compact professional MBE design
● Used in Group III/V, Group II/VI, metals, magnetic materials, topological insulators, 2D materials, etc
● Max 2-inch sample and backward compatible
● 8 standard CF flanges
● Professional liquid nitrogen cold screen design
● Multiple sample station heaters (Option)
● Sample table liquid nitrogen cooling (Option)
We can provide different types of evaporation sources according to customer needs, including K-cell, electron beam evaporation source, thermal cracking source, valve cracking source, gas cracking source, etc. In situ monitoring of sample growth can be achieved using quartz crystal oscillator, reflective high energy electron diffractometer (RHEED) or quadrupole mass spectrometer.
Please feel free to contact us if you have equipment requirements or technical inquiries.
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