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Molecular beam epitaxy system OCTOPLUS 600
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China
Main Products:
Molecular beam epitaxy system (MBE), pulsed laser deposition system (PLD), reflective high energy electron diffractometer (RHEED), evaporation source, electron gun, ion gun, etc
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Product information

Molecular beam epitaxy MBE system

The OCTOPLUS 600 molecular beam epitaxy system is compatible with 3x2 inch, or single 6-inch substrate, with high reliability and versatility, and is suitable for the development and production of Group III/V, II/VI or other heterostructural material growth applications.

 

Standard MBE system -OCTOPLUS 600

Chamber size: 600 mm ID, liquid nitrogen cold screen

Background vacuum: < 5 × 10-11 mbar

Vacuum system: cold pump + ion pump + titanium sublimation pump

Sample size: 4 or 6 inches, backward compatible

Heater: Optional Ta/PG/W material, up to 800 °C, 1000 °C or 1400 °C

Source furnace flange: 12 × DN 100 CF

Applications: SiGe, III-V, II-VI, 2D materials, topological superconducting materials, etc

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