
Post Requirements

Post Requirements
Product information
characteristics
This equipment is specially designed for the coating production of high-end precision optical thin film devices. It adopts imported magnetic levitation molecular pump high vacuum pump unit, is equipped with radio frequency ion source and optical film thickness controller, and a fully automatic coating operating system. It is especially suitable for high-end plating multilayer optical films, such as various thin films, bandpass filter films, IR-CUT films, dielectric high-reflection films and other applications.
technical parameters
Main structure: Box-type vertical front door (inner cavity size: 1550mm x 1500mm)
No-load limit vacuum: 8 x 10^(-5)Pa (12 hours, no-load)
Working vacuum: 5 x 10^(-3)Pa,<12min
Electron gun: E-type double gun, 1 12-hole crucible, 1 ring crucible
Film thickness control: six-probe quartz crystal control + optical film thickness controller
Ion source: 17cm or 25cm RF ion source
Baking heating system: up and down baking, maximum baking power 24KW, upper, middle and lower temperatures <5℃
Fully automatic control system: touch screen + Omron PLC+ industrial computer control, process parameters can be recorded and traced
Maximum power consumption: approximately 55KW





















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