SUMEC TOUCH WORLD

Swiss Platit is a well-known tool coating company that has emerged in recent years. It is a member of the BCI Group and is affiliated with WBlosch AG. WBlosch was established in 1947 and is mainly engaged in the case gold plating and gemstone industries; in 1977, it opened the PVD (Physical Coating) department; in 1979, it established a vacuum deposition production plant; in 1985, it began to engage in the production of hard films; in 1987, it registered the PLATIT brand; in 1992, the first coating equipment was assembled; in 2000, based on PL50 and PL200, a complete coating system was established, achieving turnkey engineering capabilities; In 2002, through research on nanostructured coatings, a rotating target π80 coating equipment was developed; in 2003, nACoR nanostructured coatings reached the level of industrial application.

As of 2004, Platit had produced approximately 100 coating equipment. Platit has coating processing centers in the Czech Republic, Slovenia, the United States, China Hong Kong, Spain, and Scandinacia. Its coating equipment has a total of five series: iPL50, PL200, MO200, PL1000 and π80. The application fields mainly involve tools, molds and wear-resistant parts.

Platit mainly uses rectangular large-area planar target cathode arc coating technology. This technology originated in the mid-1990s, allowing each cathode target to completely cover the effective coating area, and the maximum target height can reach 800 mm. Due to the successful solution, the arc control technology has greatly improved the coating uniformity in the vacuum furnace compared with similar technologies. Generally, the unevenness in the furnace can be controlled within 10%, and the absolute deviation is less than 0.5μm.

The π80 coating equipment developed by the company in 2002 is unique and innovative.π80 equipment is quite different from traditional coating equipment. First, the concept of nanostructure thin films is introduced to For example, the (nc-Ti1-xAlxN)/(α Si3N4) nanocomposite phase structure film is embedded in the amorphous Si3N4 body under the action of strong plasma. This structure makes the film The hardness can reach 50GPa, and the high temperature hardness is very prominent. When the temperature reaches 1200℃, its hardness value can still remain at 30GPa; Second, although cathode arc technology is still used in industrial production equipment, the evaporation source has been transformed from the original planar form to a rotatable cylindrical target. The benefits may be multi-faceted, such as automatic cleaning, high target utilization rate, and coating surface roughness up to Ra0.02~0.03μm (Generally, the coating is about Ra0.1μm), π80 can coat TiN, TiAlN, AlTiN, nACo, TiCN-Mp, TiAlCN, CrN, ZrN, DLC, etc., like other traditional coating equipment.

Swiss Platit is a well-known tool coating company that has emerged in recent years. It is a member of the BCI Group and is affiliated with WBlosch AG. WBlosch was established in 1947 and is mainly engaged in the case gold plating and gemstone industries; in 1977, it opened the PVD (Physical Coating) department; in 1979, it established a vacuum deposition production plant; in 1985, it began to engage in the production of hard films; in 1987, it registered the PLATIT brand; in 1992, the first coating equipment was assembled; in 2000, based on PL50 and PL200, a complete coating system was established, achieving turnkey engineering capabilities; In 2002, through research on nanostructured coatings, a rotating target π80 coating equipment was developed; in 2003, nACoR nanostructured coatings reached the level of industrial application.

As of 2004, Platit had produced approximately 100 coating equipment. Platit has coating processing centers in the Czech Republic, Slovenia, the United States, China Hong Kong, Spain, and Scandinacia. Its coating equipment has a total of five series: iPL50, PL200, MO200, PL1000 and π80. The application fields mainly involve tools, molds and wear-resistant parts.

Platit mainly uses rectangular large-area planar target cathode arc coating technology. This technology originated in the mid-1990s, allowing each cathode target to completely cover the effective coating area, and the maximum target height can reach 800 mm. Due to the successful solution, the arc control technology has greatly improved the coating uniformity in the vacuum furnace compared with similar technologies. Generally, the unevenness in the furnace can be controlled within 10%, and the absolute deviation is less than 0.5μm.

The π80 coating equipment developed by the company in 2002 is unique and innovative.π80 equipment is quite different from traditional coating equipment. First, the concept of nanostructure thin films is introduced to For example, the (nc-Ti1-xAlxN)/(α Si3N4) nanocomposite phase structure film is embedded in the amorphous Si3N4 body under the action of strong plasma. This structure makes the film The hardness can reach 50GPa, and the high temperature hardness is very prominent. When the temperature reaches 1200℃, its hardness value can still remain at 30GPa; Second, although cathode arc technology is still used in industrial production equipment, the evaporation source has been transformed from the original planar form to a rotatable cylindrical target. The benefits may be multi-faceted, such as automatic cleaning, high target utilization rate, and coating surface roughness up to Ra0.02~0.03μm (Generally, the coating is about Ra0.1μm), π80 can coat TiN, TiAlN, AlTiN, nACo, TiCN-Mp, TiAlCN, CrN, ZrN, DLC, etc., like other traditional coating equipment.