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Eulitha is a world leader in high-quality lithography solutions for photonics manufacturing. Established in 2006, Eulitha constantly innovates and develops new lithography techniques and technologies to meet the ever-evolving needs of the photonics market.

Eulitha, a pioneer in nanofabrication solutions, offers a suite of innovative technologies, notably the PHABLE (PHOTONICS ENABLER) and Displacement Talbot Lithography (DTL). These solutions propel the company to the forefront of nanofabrication, transforming industries that demand precision and repeatability.

Founded in 2006.

In the canton Aargau of Switzerland. Its founders have led the development of Extreme Ultraviolet Interference Technology at the Paul Scherrer Institute. Having entered the market with products based on its EUV technology, Eulitha has expanded its range of products with the addition of state-of-the-art electron beam lithography technology to its capabilities.

In 2010.

Eulitha announced the breakthrough PHABLE™ technology, which greatly simplifies production of periodic nanostructures over wafer scale areas. The company has a global customer base of researchers from industrial and academic laboratories. Backed by private Swiss equity Eulitha serves its growing number of customers from two locations in Kirchdorf and the Paul Scherrer Institute.