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Eulitha是全球领先的高品质光刻解决方案供应商。Eulitha成立于2006年，不断创新和开发新的光刻技术和技术，以满足光电子市场不断发展的需求。
Eulitha是纳米制造解决方案的先驱，提供一套创新技术，特别是PHABLE (PHOTONICS ENABLER)和位移塔尔博特光刻(DTL)。这些解决方案推动公司走在纳米制造的前沿，改变了要求精度和可重复性的行业。
Founded in 2006.
In the canton Aargau of Switzerland. Its founders have led the development of Extreme Ultraviolet Interference Technology at the Paul Scherrer Institute. Having entered the market with products based on its EUV technology, Eulitha has expanded its range of products with the addition of state-of-the-art electron beam lithography technology to its capabilities.
In 2010.
Eulitha announced the breakthrough PHABLE™ technology, which greatly simplifies production of periodic nanostructures over wafer scale areas. The company has a global customer base of researchers from industrial and academic laboratories. Backed by private Swiss equity Eulitha serves its growing number of customers from two locations in Kirchdorf and the Paul Scherrer Institute.